Products
153nm SilvoFEᵀᴹ II Macro IP
153nm SilvoFE IIᵀᴹ Technology for "eFlash + eEEPROM"
SilvoFE IIᵀᴹ means Single Low Voltages Flash & EEPROM to enable customers to integrate logice circuit, embedded Flash & embedded EEPROM into a single chip, especially for ultra low power application.
110nm SilvoFE IIᵀᴹ technology was started development since 2024 Q3, and targets to mass production in 2025 Q2.
153nm SilvoFE IIᵀᴹ Advantage
153nm SilvoFE IIᵀᴹ Macro IP in 5V Process Platform
153nm SilvoFE IIᵀᴹ Macro IP Floor-Plan:
* Macro IP Vdd=2V~5.5V
* eFlash data width x 8 + eEEPROM data width x8
* Macro IP Vdd=2V~5.5V
* eFlash data width x 16 + eEEPROM data width x8
