Technology

SilvoFE IIᵀᴹ Technology Overview

SilvoFE IIᵀᴹ refers "Single low voltages Flash+EEPROM, which is the 2nd generation of SilvoFETM tehcnology for making one process to support both eFlash and eEEPROM features. This technoloy only needs extra 3~4 masks based on logic or BCD process. 

SilvoFE IIᵀᴹ Technology's Advantages :

• Low Cost

  - Cutting edge cell structure with small bitcell size

  - 3~4 mask layer

  - Customized Macro for embedded and ROM

• Low Voltages (Vdd)

  - Maximal voltages at 12V in Macro IP, instead of 15V

  - Truly 5V device for logic platform

• Truly EEPROM

  - Byte PG/ER opation in array

  - High Endurance > 100K PG/ER cycles

   - High Data-retention > 20 years@85°C